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  Comparative study of the growth of sputtered aluminum oxide films on organic and inorganic substrates

Sellner, S., Gerlach, A., Kowarik, S., Schreiber, F., Dosch, H., Meyer, S., et al. (2008). Comparative study of the growth of sputtered aluminum oxide films on organic and inorganic substrates. Thin Solid Films, (516), 6377-6381.

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 Creators:
Sellner, S.1, Author           
Gerlach, A.2, Author
Kowarik, S.2, Author
Schreiber, F.3, Author           
Dosch, H.1, 4, Author           
Meyer, S.2, Author
Pflaum, J.2, Author
Ulbricht, G.2, Author
Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645              
2Institut für Theoretische und Angewandte Physik, Universität Stuttgart, Pfaffenwaldring 57, 70550 Stuttgart, Germany; Institut für Angewandte Physik, Universität Tübingen, Auf der Morgenstelle 10, 72076 Tübingen, Germany; Physical and Theoretical Chemistry Laboratory, Oxford University, South Parks Road, Oxford OX1 3QZ, United Kingdom; III. Physikalisches Institut, Universität Stuttgart, Paffenwaldring 57, 70550 Stuttgart, Germany, Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 3, 70569 Stuttgart, Germany;, ou_persistent22              
3Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
4Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Dosch;
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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 361973
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Title: Thin Solid Films
Source Genre: Journal
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Pages: - Volume / Issue: (516) Sequence Number: - Start / End Page: 6377 - 6381 Identifier: -