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  Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model system for Ru-capped extreme ultraviolet lithography optics

He, Y., Goriachko, A., Korte, C., Farkas, A., Mellau, G., Dudin, P., et al. (2007). Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model system for Ru-capped extreme ultraviolet lithography optics. Journal of Physical Chemistry C, 111(24), 10988-10992.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-42A9-E Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-42AA-C
Genre: Journal Article
Alternative Title : J. Phys. Chem. C

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 Creators:
He, Y.B1, Author              
Goriachko, A.2, Author
Korte, C.2, Author
Farkas, A.2, Author
Mellau, G.2, Author
Dudin, P.2, Author
Gregoratti, L.2, Author
Barinov, A.2, Author
Kiskinova, M.2, Author
Stierle, A.3, Author              
Kasper, N.1, Author              
Bajt, S.2, Author
Over, H.2, Author
Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645              
2Department of Physical Chemistry, Justus-Liebig-University, Heinrich-Buff-Ring, 35392 Giessen, Germany; Sincrotrone Trieste, Area Science Park, 34012 Basovizza-Trieste, Italy; Lawrence Livermore Laboratory, 700 East Avenue, Livermore, California 94550, USA, ou_persistent22              
3Former Central Scientific Facility ANKA Synchroton Beamline, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497651              

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Free keywords: MPI für Metallforschung; Abt. Dosch;
 Abstract: -

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Language(s): eng - English
 Dates: 2007-05-11
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: eDoc: 333648
 Degree: -

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Title: Journal of Physical Chemistry C
  Alternative Title : J. Phys. Chem. C
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 111 (24) Sequence Number: - Start / End Page: 10988 - 10992 Identifier: -