Backscattering effect in quantitative AES sputter depth profiling of multilayers

Hofmann, S.; Wang, J. Y.; Zalar, A.

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Backscattering effect in quantitative AES sputter depth profiling of multilayers

Hofmann, S., Wang, J. Y., & Zalar, A. (2007). Backscattering effect in quantitative AES sputter depth profiling of multilayers. Surface and Interface Analysis, 39, 787-797.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-44AF-E Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-44B0-8

Genre: Journal Article

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Creators:
Hofmann, S.¹, Author
Wang, J. Y.¹, Author
Zalar, A., Author

Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer; Emeriti and Others;

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Language(s): eng - English

Dates: Date issued: 2007

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 335118

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Title: Surface and Interface Analysis

Source Genre: Journal

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Pages: - Volume / Issue: 39 Sequence Number: - Start / End Page: 787 - 797 Identifier: -