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  In-situ high-resolution transmission electron microscopy study of interfacial reactions of Cu thin films on amorphous silicon

Lee, S. B., Choi, D.-K., Phillipp, F., Jeon, K.-S., & Kim, C. K. (2006). In-situ high-resolution transmission electron microscopy study of interfacial reactions of Cu thin films on amorphous silicon. Applied Physics Letters, 88: 083117.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-46AF-B Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-46B0-5
Genre: Journal Article
Alternative Title : APL

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 Creators:
Lee, S. B.1, Author           
Choi, D.-K.2, Author
Phillipp, F.1, Author           
Jeon, K.-S.2, Author
Kim, C. K.2, Author
Affiliations:
1Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              
2Department of Ceramic Engineering, Hanyang University, Seoul, South Korea;Department of Materials Science and Engineering, Hanyang University, Seoul, South Korea, ou_persistent22              

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Free keywords: MPI für Metallforschung; Zentrum für Elektronenmikroskopie;
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Language(s): eng - English
 Dates: 2006
 Publication Status: Issued
 Pages: 3 pages
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 282005
 Degree: -

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Title: Applied Physics Letters
  Alternative Title : APL
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 88 Sequence Number: 083117 Start / End Page: - Identifier: -