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  Epitaxy and bonding of Cu films on oxygen-terminated α-Al2O3(0001) surfaces

Oh, S. H., Scheu, C., Wagner, T., Tchernychova, E., & Rühle, M. (2006). Epitaxy and bonding of Cu films on oxygen-terminated α-Al2O3(0001) surfaces. Acta Materialia, 54, 2685-2696.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-487A-2 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-487B-F
Genre: Journal Article

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 Creators:
Oh, S. H., Author              
Scheu, C., Author              
Wagner, T.1, Author              
Tchernychova, E., Author              
Rühle, M.2, Author              
Affiliations:
1Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640              
2Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, DE, ou_1497650              

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Free keywords: MPI für Metallforschung; Emeriti and Others; Abt. Arzt; Stuttgart Center for Electron Microscopy (StEM);
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Language(s): eng - English
 Dates: 2006
 Publication Status: Published in print
 Pages: -
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 Rev. Type: Peer
 Identifiers: eDoc: 318160
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Title: Acta Materialia
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 54 Sequence Number: - Start / End Page: 2685 - 2696 Identifier: -