English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
  Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling

Wang, J. Y., Liu, Y., Hofmann, S., & Kovac, J. (2012). Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling. 5, 569-572. doi:10.1002/sia.3855.

Item is

Files

show Files

Locators

show

Creators

show
hide
 Creators:
Wang, J. Y.1, Author              
Liu, Y.2, Author
Hofmann, S.3, Author              
Kovac, J.2, Author
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong, China;Department of Surface Engineering and Optoelectronics F4, Jozef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia, ou_persistent22              
3Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, DE, ou_1497650              

Content

show
hide
Free keywords: MPI für Intelligente Systeme; Emeriti and Others;
 Abstract: -

Details

show
hide
Language(s): eng - English
 Dates: 2012
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 574220
DOI: 10.1002/sia.3855
 Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show
hide
Title: 5
Source Genre: Issue
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 569 - 572 Identifier: -

Source 2

show
hide
Title: Surface and Interface Analysis
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 44 Sequence Number: - Start / End Page: - Identifier: -