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  Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling

Wang, J. Y., Liu, Y., Hofmann, S., & Kovac, J. (2012). Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling. 5, 569-572. doi:10.1002/sia.3855.

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 Creators:
Wang, J. Y.1, Author           
Liu, Y.2, Author
Hofmann, S.3, Author           
Kovac, J.2, Author
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong, China;Department of Surface Engineering and Optoelectronics F4, Jozef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia, ou_persistent22              
3Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, DE, ou_1497650              

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Free keywords: MPI für Intelligente Systeme; Emeriti and Others;
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Language(s): eng - English
 Dates: 2012
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 574220
DOI: 10.1002/sia.3855
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Title: 5
Source Genre: Issue
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Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 569 - 572 Identifier: -

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Title: Surface and Interface Analysis
Source Genre: Journal
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Pages: - Volume / Issue: 44 Sequence Number: - Start / End Page: - Identifier: -