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  Dynamic behavior of nanometer-scale amorphous intergranular film in silicon nitride by in situ high-resolution transmission electron microscopy

Zhang, Z., Sigle, W., Koch, C. T., & Rühle, M. (2011). Dynamic behavior of nanometer-scale amorphous intergranular film in silicon nitride by in situ high-resolution transmission electron microscopy. Journal of the European Ceramic Society, 31(9), 1835-1840. doi:10.1016/j.jeurceramsoc.2011.03.016.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-4E5A-F Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-4E5B-D
Genre: Journal Article

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 Creators:
Zhang, Z., Author              
Sigle, W.1, Author              
Koch, C. T.1, Author              
Rühle, M.2, Author              
Affiliations:
1Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              
2Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, DE, ou_1497645              

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Free keywords: MPI für Intelligente Systeme; Stuttgart Center for Electron Microscopy (StEM); Ehem. Abt. Rühle;
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Language(s): eng - English
 Dates: 2011
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 575316
DOI: 10.1016/j.jeurceramsoc.2011.03.016
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Title: Journal of the European Ceramic Society
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 31 (9) Sequence Number: - Start / End Page: 1835 - 1840 Identifier: -