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  Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM

Üzüm, C., Hellwig, J., Madaboosi, N., Volodkin, D., & von Klitzing, R. (2012). Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM. Beilstein Journal of Nanotechnology, 3, 778-788.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0015-4222-7 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0015-4223-5
Genre: Journal Article

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629907.pdf (Any fulltext), 2MB
 
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 Creators:
Üzüm, C., Author
Hellwig, J., Author
Madaboosi, N.1, Author              
Volodkin, D.1, Author              
von Klitzing, R.1, Author              
Affiliations:
1Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863287              

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Free keywords: atomic force microscopy; polyelectrolyte multilayers; stress relaxation; viscoelasticity; Young's modulus
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Language(s): eng - English
 Dates: 2012-11-21
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Method: Peer
 Identifiers: eDoc: 629907
ISI: 000311482200001
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Title: Beilstein Journal of Nanotechnology
  Alternative Title : Beilstein J. Nanotechnol.
Source Genre: Journal
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Publ. Info: FRANKFURT AM MAIN : BEILSTEIN-INSTITUT
Pages: - Volume / Issue: 3 Sequence Number: - Start / End Page: 778 - 788 Identifier: ISSN: 2190-4286