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  Transient processes at the deposition of charged Langmuir monolayers

Bondarenko, M. P., Kovalchuk, V. I., Zholkovskiy, E. K., & Vollhardt, D. (2010). Transient processes at the deposition of charged Langmuir monolayers. Colloids and Surfaces A-Physicochemical and Engineering Aspects, 354(1-3 Sp. Iss.), 226-233.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0015-4C82-1 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0015-4C83-0
Genre: Journal Article

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474722.pdf (Any fulltext), 416KB
 
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 Creators:
Bondarenko, M. P., Author
Kovalchuk, V. I.1, Author              
Zholkovskiy, E. K., Author
Vollhardt, D.2, Author              
Affiliations:
1Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863287              
2Reinhard Miller, Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863313              

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Free keywords: Langmuir-Blodgett films; Transient processes; Charged Langmuir monolayers; Three-phase contact; Meniscus relaxation; Electrokinetic mechanism; Concentration polarization; Pattern formation
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Language(s): eng - English
 Dates: 2010-02-05
 Publication Status: Published in print
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 Rev. Type: Peer
 Identifiers: eDoc: 474722
ISI: 000275351300031
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Title: Colloids and Surfaces A-Physicochemical and Engineering Aspects
  Alternative Title : Colloid Surf. A-Physicochem. Eng. Asp.
Source Genre: Journal
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Pages: - Volume / Issue: 354 (1-3 Sp. Iss.) Sequence Number: - Start / End Page: 226 - 233 Identifier: ISSN: 0927-7757