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  Transient processes at the deposition of charged Langmuir monolayers

Bondarenko, M. P., Kovalchuk, V. I., Zholkovskiy, E. K., & Vollhardt, D. (2010). Transient processes at the deposition of charged Langmuir monolayers. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 354(1-3 Sp. Iss.), 226-233. doi:10.1016/j.colsurfa.2009.09.023.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0015-4C82-1 Version Permalink: https://hdl.handle.net/21.11116/0000-0007-6FAD-B
Genre: Journal Article

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474722.pdf (Publisher version), 416KB
 
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 Creators:
Bondarenko, M. P., Author
Kovalchuk, V. I., Author
Zholkovskiy, E. K., Author
Vollhardt, D.1, Author           
Affiliations:
1Reinhard Miller, Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863313              

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Free keywords: Langmuir-Blodgett films; Transient processes; Charged Langmuir monolayers; Three-phase contact; Meniscus relaxation; Electrokinetic mechanism; Concentration polarization; Pattern formation
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Language(s): eng - English
 Dates: 2010
 Publication Status: Issued
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 474722
ISI: 000275351300031
DOI: 10.1016/j.colsurfa.2009.09.023
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Title: Colloids and Surfaces A: Physicochemical and Engineering Aspects
Source Genre: Journal
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Publ. Info: Amsterdam : Elsevier
Pages: - Volume / Issue: 354 (1-3 Sp. Iss.) Sequence Number: - Start / End Page: 226 - 233 Identifier: ISSN: 0927-7757