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  Composition-Dependent Oxygen Reduction Activity and Stability of Pt–Cu Thin Films

Schuppert, A. K., Topalov, A. A., Savan, A., Ludwig, A., & Mayrhofer, K. J. J. (2014). Composition-Dependent Oxygen Reduction Activity and Stability of Pt–Cu Thin Films. ChemElectroChem, 1(2), 358-361. doi:10.1002/celc.201300078.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-1FD4-2 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0027-D292-B
Genre: Journal Article

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 Creators:
Schuppert, Anna Katharina1, Author              
Topalov, Angel Angelov1, Author              
Savan, Alan2, Author              
Ludwig, Alfred2, Author              
Mayrhofer, Karl Johann Jakob1, Author              
Affiliations:
1Electrocatalysis, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863354              
2Faculty of Mechanical Engineering, Ruhr-Universität Bochum, Universitätsstr. 150, Bochum, Germany, ou_persistent22              

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Language(s): eng - English
 Dates: 2014-02-11
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: eDoc: 670325
DOI: 10.1002/celc.201300078
 Degree: -

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Title: ChemElectroChem
Source Genre: Journal
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Publ. Info: Weinheim, Germany : WILEY-VCH Verlag GmbH & Co. KGaA
Pages: - Volume / Issue: 1 (2) Sequence Number: - Start / End Page: 358 - 361 Identifier: ISSN: 2196-0216