Investigation of Electrochemical Oxygen Reduction on Semiconductor Surfaces by 
Attenuated Total Internal Reflection Infrared Spectroscopy

Nayak, S.

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Investigation of Electrochemical Oxygen Reduction on Semiconductor Surfaces by Attenuated Total Internal Reflection Infrared Spectroscopy

Nayak, S. (2013). Investigation of Electrochemical Oxygen Reduction on Semiconductor Surfaces by Attenuated Total Internal Reflection Infrared Spectroscopy. PhD Thesis, Fakultät für Chemie und Biochemie, Ruhr-Universität Bochum, Bochum, Germany.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-2464-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-2466-F

Genre: Thesis

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Creators:
Nayak, S.¹, Author
Stratmann, M.², Advisor
Havenith, M., Advisor

Affiliations:
1Interface Spectroscopy, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863358
2Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863348

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Language(s): eng - English

Dates: Accepted: 2013-03-18

Publication Status: Accepted / In Press

Pages: 137

Publishing info: Bochum, Germany : Fakultät für Chemie und Biochemie, Ruhr-Universität Bochum

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 636415

Degree: PhD

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