Accelerated self-diffusion in fcc metals due to H induced superabundant 
vacancies

Nazarov, R.; Hickel, T.; Neugebauer, J.

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Accelerated self-diffusion in fcc metals due to H induced superabundant vacancies

Nazarov, R., Hickel, T., & Neugebauer, J. (2012). Accelerated self-diffusion in fcc metals due to H induced superabundant vacancies. Talk presented at TMS 2012 Meeting. Orlando, FL, USA. 2012-03-11 - 2012-03-15.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-2B1E-E Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-2B20-6

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Urheber:
Nazarov, R.¹, Autor
Hickel, T.¹, Autor
Neugebauer, J.², Autor

Affiliations:
1Computational Phase Studies, Computational Materials Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863341
2Computational Materials Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863337