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  Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

Muglali, M. I., Bashir, A., Birkner, A., & Rohwerder, M. (2012). Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers. Journal of Materials Chemistry, 22(29), 14337-14340. doi:10.1039/c2jm32111d.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-2DF9-0 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0025-06D8-3
Genre: Journal Article

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 Creators:
Muglali, Mutlu Iskender1, Author              
Bashir, Asif1, Author              
Birkner, Alexander2, Author              
Rohwerder, Michael1, Author              
Affiliations:
1Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360              
2Physical Chemistry i, Ruhr-University Bochum, D-44780 Bochum, Germany, ou_persistent22              

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Language(s): eng - English
 Dates: 2012-08-07
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: eDoc: 628018
DOI: 10.1039/c2jm32111d
 Degree: -

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Title: Journal of Materials Chemistry
Source Genre: Journal
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Publ. Info: Cambridge, UK : Royal Society of Chemistry
Pages: - Volume / Issue: 22 (29) Sequence Number: - Start / End Page: 14337 - 14340 Identifier: ISSN: 0959-9428
CoNE: /journals/resource/954925273429