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  Segregation and selective surface oxidation at the intermediate steps of recrystallization annealing

Swaminathan, S., & Rohwerder, M. (2011). Segregation and selective surface oxidation at the intermediate steps of recrystallization annealing. Defect and Diffusion Forum, 309-310, 203-208.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-3485-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0025-6B53-5
Genre: Conference Paper

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 Creators:
Swaminathan, Srinivasan1, 2, Author           
Rohwerder, Michael1, 2, Author           
Affiliations:
1Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360              
2Christian Doppler Laboratory for Diffusion and Segregation Mechanisms, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863352              

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Language(s): eng - English
 Dates: 2011
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 579673
DOI: 10.4028/www.scientific.net/DDF.309-310.203
 Degree: -

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Title: International Conference on Grain Boundary Diffusion, Stresses and Segregation, DSS 2010
Place of Event: Moscow, Russia
Start-/End Date: 2010-06-01 - 2010-06-04

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Title: Defect and Diffusion Forum
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Aedermannsdorf, Switzerland : Trans Tech
Pages: - Volume / Issue: 309-310 Sequence Number: - Start / End Page: 203 - 208 Identifier: ISSN: 1012-0386
CoNE: https://pure.mpg.de/cone/journals/resource/958480187942