Application of the relaxed grain cluster homogenization scheme to deep drawing 
simulation of dual-phase steel

Tjahjanto, D. D.; Roters, F.; Eisenlohr, P.

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Application of the relaxed grain cluster homogenization scheme to deep drawing simulation of dual-phase steel

Tjahjanto, D. D., Roters, F., & Eisenlohr, P. (2009). Application of the relaxed grain cluster homogenization scheme to deep drawing simulation of dual-phase steel. Talk presented at 1st International Conference on Material Modelling (ICMM 1). Dortmund, Germany. 2009-09-15 - 2009-09-17.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-3F44-E Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-3F46-A

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Creators:
Tjahjanto, D. D.¹, Author
Roters, F.², Author
Eisenlohr, P.³, Author

Affiliations:
1External Organizations, ou_persistent22
2Theory and Simulation, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863392
3MPG-FhG Computational Mechanics of Polycrystals Group, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863389

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Language(s): eng - English

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Identifiers: eDoc: 437068

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Title: 1st International Conference on Material Modelling (ICMM 1)

Place of Event: Dortmund, Germany

Start-/End Date: 2009-09-15 - 2009-09-17

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