Application of the relaxed grain cluster homogenization scheme to deep drawing 
simulation of dual-phase steel

Tjahjanto, D. D.; Roters, F.; Eisenlohr, P.

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Application of the relaxed grain cluster homogenization scheme to deep drawing simulation of dual-phase steel

Tjahjanto, D. D., Roters, F., & Eisenlohr, P. (2009). Application of the relaxed grain cluster homogenization scheme to deep drawing simulation of dual-phase steel. Talk presented at 1st International Conference on Material Modelling (ICMM 1). Dortmund, Germany. 2009-09-15 - 2009-09-17.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-3F44-E Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-3F46-A

Genre: Vortrag

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Urheber:
Tjahjanto, D. D.¹, Autor
Roters, F.², Autor
Eisenlohr, P.³, Autor

Affiliations:
1External Organizations, ou_persistent22
2Theory and Simulation, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863392
3MPG-FhG Computational Mechanics of Polycrystals Group, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863389