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  In-situ backside surface enhanced Raman study on the reactive wetting process at noble metal-monolayer interfaces supported by SKP, XPS and ToF-SIMS

Santa, M., Posner, R., & Grundmeier, G. (2009). In-situ backside surface enhanced Raman study on the reactive wetting process at noble metal-monolayer interfaces supported by SKP, XPS and ToF-SIMS. Talk presented at Kurt Schwabe Symposium 2009. Erlangen, Germany. 2009-05-24 - 2009-05-28.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-4118-0 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-411B-A
Genre: Talk

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 Creators:
Santa, M.1, Author              
Posner, R.2, Author              
Grundmeier, G.2, Author              
Affiliations:
1Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863349              
2Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863353              

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Language(s): eng - English
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 Publication Status: Not specified
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 477007
 Degree: -

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Title: Kurt Schwabe Symposium 2009
Place of Event: Erlangen, Germany
Start-/End Date: 2009-05-24 - 2009-05-28

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