In-situ backside surface enhanced Raman study on the reactive wetting process 
at noble metal-monolayer interfaces supported by SKP, XPS and ToF-SIMS

Santa, M.; Posner, R.; Grundmeier, G.

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In-situ backside surface enhanced Raman study on the reactive wetting process at noble metal-monolayer interfaces supported by SKP, XPS and ToF-SIMS

Santa, M., Posner, R., & Grundmeier, G. (2009). In-situ backside surface enhanced Raman study on the reactive wetting process at noble metal-monolayer interfaces supported by SKP, XPS and ToF-SIMS. Talk presented at Kurt Schwabe Symposium 2009. Erlangen, Germany. 2009-05-24 - 2009-05-28.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-4118-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-411B-A

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Creators:
Santa, M.¹, Author
Posner, R.², Author
Grundmeier, G.², Author

Affiliations:
1Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863349
2Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863353

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Language(s): eng - English

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Identifiers: eDoc: 477007

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Title: Kurt Schwabe Symposium 2009

Place of Event: Erlangen, Germany

Start-/End Date: 2009-05-24 - 2009-05-28

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