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  Residual stress analysis in chemical-vapor-deposition diamond films

Liu, T., Pinto, H., Brito, P., Sales, L. A., & Raabe, D. (2009). Residual stress analysis in chemical-vapor-deposition diamond films. Applied Physics Letters, 94(20): 201902 (3pp). doi:10.1063/1.3139083.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-4121-9 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-4123-5
Genre: Journal Article

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 Creators:
Liu, T.1, Author              
Pinto, H.2, Author              
Brito, P.3, Author              
Sales, L. A., Author
Raabe, D.4, Author              
Affiliations:
1Microscopy and Diffraction, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863391              
2Materials Testing, Material Diagnostics and Steel Technology, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863363              
3External Organizations, ou_persistent22              
4Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863381              

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Language(s): eng - English
 Dates: 2009-05-20
 Publication Status: Published in print
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Title: Applied Physics Letters
  Alternative Title : Appl. Phys. Letters
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 94 (20) Sequence Number: 201902 (3pp) Start / End Page: - Identifier: -