TiO2 nanocomposite thin films prepared by means of RF-magnetron sputtering

Keil, P.; Möllmann, V.; Zuo, J.; Titz, T.; Grundmeier, G.

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TiO2 nanocomposite thin films prepared by means of RF-magnetron sputtering

Keil, P., Möllmann, V., Zuo, J., Titz, T., & Grundmeier, G. (2009). TiO2 nanocomposite thin films prepared by means of RF-magnetron sputtering. Talk presented at 5th International Materials Symposium, MATERIAIS 2009. Lisbon, Portugal. 2009-04-04 - 2009-04-08.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-4187-5 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-4189-1

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Urheber:
Keil, P.¹, Autor
Möllmann, V., Autor
Zuo, J.², Autor
Titz, T.³, Autor
Grundmeier, G.¹, Autor

Affiliations:
1Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863353
2Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863349
3External Organizations, ou_persistent22