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  Growth of multioxide planar film with the nanoscale inner structure via anodizing Al/Ta layers on Si

Mozalev, A., Smith, A. J., Borodin, S., Plihauka, A., Hassel, A. W., Sakairi, M., et al. (2009). Growth of multioxide planar film with the nanoscale inner structure via anodizing Al/Ta layers on Si. Electrochim. Acta, 54, 935-945. doi:10.1016/j.electacta.2008.08.030.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-42FA-C Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-42FD-6
Genre: Journal Article

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Mozalev, A., Author
Smith, A. J.1, Author              
Borodin, S.2, Author              
Plihauka, A., Author
Hassel, A. W.3, Author              
Sakairi, M., Author
Takahashi, H., Author
Affiliations:
1External Organizations, ou_persistent22              
2Christian Doppler Laboratory for Diffusion and Segregation Mechanisms, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863352              
3Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863355              

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 Dates: 2009
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: eDoc: 378918
DOI: 10.1016/j.electacta.2008.08.030
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Title: Electrochim. Acta
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 54 Sequence Number: - Start / End Page: 935 - 945 Identifier: -