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  Growth of multioxide planar film with the nanoscale inner structure via anodizing Al/Ta layers on Si

Mozalev, A., Smith, A. J., Borodin, S., Plihauka, A., Hassel, A. W., Sakairi, M., et al. (2009). Growth of multioxide planar film with the nanoscale inner structure via anodizing Al/Ta layers on Si. Electrochim. Acta, 54, 935-945. doi:10.1016/j.electacta.2008.08.030.

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 Creators:
Mozalev, A., Author
Smith, A. J.1, Author           
Borodin, S.2, Author           
Plihauka, A., Author
Hassel, A. W.3, Author           
Sakairi, M., Author
Takahashi, H., Author
Affiliations:
1External Organizations, ou_persistent22              
2Christian Doppler Laboratory for Diffusion and Segregation Mechanisms, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863352              
3Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863355              

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 Dates: 2009
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 378918
DOI: 10.1016/j.electacta.2008.08.030
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Title: Electrochim. Acta
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 54 Sequence Number: - Start / End Page: 935 - 945 Identifier: -