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  High throughput study of the anodic oxidation of Hf–Ti thin films

Mardare, A. I., Savan, A., Ludwig, A., Wieck, A. D., & Hassel, A. W. (2009). High throughput study of the anodic oxidation of Hf–Ti thin films. Electrochimica Acta, 54, 5171-5178. doi:10.1016/j.electacta.2009.01.016.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-4420-4 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-4422-F
Genre: Journal Article

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 Creators:
Mardare, A. I.1, Author              
Savan, A., Author
Ludwig, A., Author
Wieck, A. D., Author
Hassel, A. W.1, Author              
Affiliations:
1Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863355              

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Language(s): eng - English
 Dates: 2009
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: eDoc: 466061
DOI: 10.1016/j.electacta.2009.01.016
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Title: Electrochimica Acta
  Alternative Title : Electrochim. Acta
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 54 Sequence Number: - Start / End Page: 5171 - 5178 Identifier: -