Studies on Copper Repassivation Characteristics in Basic Solutions Another Step 
towards a “Traditional” CMP

Ein-Eli, Y.; Abelev, E.; Smith, A. J.; Hassel, A. W.

Local TagsRelease HistoryDetailsSummary

Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP

Ein-Eli, Y., Abelev, E., Smith, A. J., & Hassel, A. W. (2006). Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP. Talk presented at 6th International Symposium on Electrochemical Micro & Nanosystem Technologies. Bonn, Germany. 2006-08-22 - 2006-08-25.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-5842-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-5844-8

Genre: Talk

Files

show Files

Locators

show

Creators

show

hide

Creators:
Ein-Eli, Y., Author
Abelev, E., Author
Smith, A. J.¹, Author
Hassel, A. W.¹, Author

Affiliations:
1Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863355

Content

show

Details

show

hide

Language(s):

Dates:

Publication Status: Not specified

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 289028

Degree: -

Event

show

hide

Title: 6th International Symposium on Electrochemical Micro & Nanosystem Technologies

Place of Event: Bonn, Germany

Start-/End Date: 2006-08-22 - 2006-08-25

Legal Case

show

Project information

show

Source

show