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  Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP

Ein-Eli, Y., Abelev, E., Smith, A. J., & Hassel, A. W. (2006). Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP. Talk presented at 6th International Symposium on Electrochemical Micro & Nanosystem Technologies. Bonn, Germany. 2006-08-22 - 2006-08-25.

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Ein-Eli, Y., Author
Abelev, E., Author
Smith, A. J.1, Author           
Hassel, A. W.1, Author           
Affiliations:
1Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863355              

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 Identifiers: eDoc: 289028
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Title: 6th International Symposium on Electrochemical Micro & Nanosystem Technologies
Place of Event: Bonn, Germany
Start-/End Date: 2006-08-22 - 2006-08-25

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