Intensity Modulated Photo Electrochemistry of Laser Irradiated Semiconductors

Fenster, J. C.; Rohwerder, M.; Hassel, A. W.

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Intensity Modulated Photo Electrochemistry of Laser Irradiated Semiconductors

Fenster, J. C., Rohwerder, M., & Hassel, A. W. (2006). Intensity Modulated Photo Electrochemistry of Laser Irradiated Semiconductors. Poster presented at 6th International Symposium on Electrochemical Micro & Nanosystem Technologies, Bonn, Germany.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-584E-3 Versions-Permalink: https://hdl.handle.net/21.11116/0000-0002-9014-4

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Urheber:
Fenster, J. C.¹, Autor
Rohwerder, M.^{2, 3}, Autor
Hassel, A. W.¹, Autor

Affiliations:
1Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863355
2Christian Doppler Laboratory for Diffusion and Segregation Mechanisms, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863352
3Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360