Surface-enhanced Raman spectroscopy of the growth of ultra-thin organosilicon 
plasma polymers on nanoporous Ag/SiO2-bilayer films

Sun, G.; Grundmeier, G.

doi:10.1016/j.tsf.2006.03.027

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Surface-enhanced Raman spectroscopy of the growth of ultra-thin organosilicon plasma polymers on nanoporous Ag/SiO₂-bilayer films

Sun, G., & Grundmeier, G. (2006). Surface-enhanced Raman spectroscopy of the growth of ultra-thin organosilicon plasma polymers on nanoporous Ag/SiO₂-bilayer films. Thin Solid Films, 515(4), 1266-1274. doi:10.1016/j.tsf.2006.03.027.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-5B3E-D Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-5B41-3

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Urheber:
Sun, G.¹, Autor
Grundmeier, G.^{1, 2}, Autor

Affiliations:
1Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863349
2Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863353