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  Temperature stability of thin anodic oxide films in metal/insulator/metal structures: A comparison between tantalum and aluminium oxide

Jeliazova, Y., Kayser, M., Mildner, B., Hassel, A. W., & Diesing, D. (2006). Temperature stability of thin anodic oxide films in metal/insulator/metal structures: A comparison between tantalum and aluminium oxide. Thin Solid Films, 500, 330-335.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-5B5C-9 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-5B5E-5
Genre: Journal Article

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 Creators:
Jeliazova, Y., Author
Kayser, M., Author
Mildner, B., Author
Hassel, A. W.1, Author              
Diesing, D., Author
Affiliations:
1Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863355              

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 Dates: 2006
 Publication Status: Published in print
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 Identifiers: eDoc: 251034
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Title: Thin Solid Films
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 500 Sequence Number: - Start / End Page: 330 - 335 Identifier: -