Chemical structure and morphology of thin bilayer and composite organosilicon 
and fluorocarbon microwave plasma polymer films

Carpentier, J.; Grundmeier, G.

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Chemical structure and morphology of thin bilayer and composite organosilicon and fluorocarbon microwave plasma polymer films

Carpentier, J., & Grundmeier, G. (2005). Chemical structure and morphology of thin bilayer and composite organosilicon and fluorocarbon microwave plasma polymer films. Surface and Coatings Technology, 192(2-3), 189-198.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-611F-F Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-6121-7

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Urheber:
Carpentier, J., Autor
Grundmeier, G.^{1, 2}, Autor

Affiliations:
1Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863349
2Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863353