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  The effect of Oxygen Reduction on the Self-Assembly and Stability of Thiol Monolayer Films

Rohwerder, M., & Stratmann, M. (2004). The effect of Oxygen Reduction on the Self-Assembly and Stability of Thiol Monolayer Films. Talk presented at 205th Meeting of the ECS. San Antonio, TX, USA. 2004-05-09 - 2004-05-14.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0019-653F-D Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0025-7477-0
Genre: Talk

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 Creators:
Rohwerder, Michael1, Author              
Stratmann, Martin2, Author              
Affiliations:
1Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360              
2Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863348              

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Free keywords: Presenter: Rohwerder, M.
 Abstract: -

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Language(s): eng - English
 Dates: 2004-05
 Publication Status: Not specified
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: eDoc: 206600
 Degree: -

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Title: 205th Meeting of the ECS
Place of Event: San Antonio, TX, USA
Start-/End Date: 2004-05-09 - 2004-05-14

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