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  Formation of mesoscopic structures by the CVD of SiH4 on Fe(100)

Rebhan, M. E., Rohwerder, M., & Stratmann, M. (2002). Formation of mesoscopic structures by the CVD of SiH4 on Fe(100). Chemical Vapor Deposition, 8(6), 259-261. doi:10.1002/1521-3862(20021203)8:6<259:AID-CVDE259>3.0.CO;2-8.

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 Creators:
Rebhan, Matthias Erwin1, 2, Author           
Rohwerder, Michael1, 3, Author           
Stratmann, Martin4, 5, Author           
Affiliations:
1Institut für Werkstoffwissenschaften IV, Universität Erlangen, 91058 Erlangen, Germany, ou_persistent22              
2Siemens AG, CT D2P, Otto-Hahn-Ring 6, 81730 Munich, Germany, ou_persistent22              
3Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360              
4Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863348              
5Institut für Werkstoffwissenschaften IV, Universität Erlangen, Erlangen, D-91058, Germany, ou_persistent22              

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Language(s): eng - English
 Dates: 2002-12
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Degree: -

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Title: Chemical Vapor Deposition
  Other : Chem. Vapor Depos.
Source Genre: Journal
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Publ. Info: Weinheim : Verlag GmbH & Co. KGaA
Pages: - Volume / Issue: 8 (6) Sequence Number: - Start / End Page: 259 - 261 Identifier: ISSN: 0948-1907
CoNE: https://pure.mpg.de/cone/journals/resource/954925573933