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  Growth and properties of strained VOx thin films with controlled stoichiometry

Rata, A. D., Chezan, A. R., Haverkort, M. W., Hsieh, H. H., Lin, H.-J.-., Chen, C. T., et al. (2004). Growth and properties of strained VOx thin films with controlled stoichiometry. Physical Review B, 69(7): 075404, pp. 1-11. doi:10.1103/PhysRevB.69.075404.

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Rata, A. D.1, Author
Chezan, A. R.1, Author
Haverkort, M. W.1, Author
Hsieh, H. H.1, Author
Lin, H.-J-1, Author
Chen, C. T.1, Author
Tjeng, L. H.2, Author           
Hibma, T.1, Author
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1external, ou_persistent22              
2External Organizations, ou_persistent22              

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 Abstract: We have succeeded in growing epitaxial films of rocksalt VOx on MgO(001) substrates. The oxygen content as a function of oxygen flux was determined using O-18(2)-Rutherford backscattering spectrometry and the vanadium valence using x-ray-absorption spectroscopy. The upper and lower stoichiometry limits found are similar to those known for bulk material (0.8<x<1.3). From the reflection high-energy electron diffraction oscillation period a large number of vacancies for both vanadium and oxygen were deduced, i.e., approximate to16% for stoichiometric VO. These numbers are, surprisingly, very similar to those for bulk material and consequently quite strain insensitive. X-ray-absorption spectroscopy measurements reveal that the vacancies give rise to strong non-cubic crystal field effects. The electrical conductivity of the films is much lower than the conductivity of bulk samples, which we attribute to a decrease in the direct overlap between t(2g) orbitals in the coherently strained layers. The temperature dependence of the conductivity is consistent with a variable range hopping mechanism.

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 Dates: 2004-02-13
 Publication Status: Issued
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Title: Physical Review B
  Other : Phys. Rev. B
Source Genre: Journal
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Publ. Info: Woodbury, NY : American Physical Society
Pages: - Volume / Issue: 69 (7) Sequence Number: 075404 Start / End Page: 1 - 11 Identifier: ISSN: 1098-0121
CoNE: https://pure.mpg.de/cone/journals/resource/954925225008