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  Experimental studies on epitaxially grown TiN and VN films

Kutschej, K., Rashkova, B., Shen, J., Edwards, D., Mitterer, C., & Dehm, G. (2007). Experimental studies on epitaxially grown TiN and VN films. Thin Solid Films, 516(2-4), 369-373. doi:10.1016/j.tsf.2007.06.104.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0024-5189-E Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0024-518A-C
Genre: Journal Article

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 Creators:
Kutschej, Kerstin1, Author              
Rashkova, Boryana2, Author              
Shen, J.1, Author              
Edwards, Darren3, Author              
Mitterer, Christian4, Author              
Dehm, Gerhard5, Author              
Affiliations:
1Department of Physical Metallurgy and Materials Testing, University of Leoben, Franz-Josef-Str. 18, A-8700 Leoben, Austria, ou_persistent22              
2Department Physical Metallurgy and Materials Testing, Montanuniversität Leoben, Franz-Josef-Strasse 18, 8700 Leoben, Austria, ou_persistent22              
3Department of Materials Physics, University of Leoben, Erich Schmid Institute for Materials Science, Jahnstr. 12, A-8700 Leoben, Austria, ou_persistent22              
4Department of Physical Metallurgy and Materials Testing, Christian-Doppler Laboratory for Advanced Coatings, University of Leoben, Austria, ou_persistent22              
5Department of Materials Physics, Montanuniversität Leoben, Austria, ou_persistent22              

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 Abstract: TiN and VN single-layers were grown on (100) and (111)MgO substrates as model systems for future studies of V diffusion and understanding the evolution of the lubricous V2O5 phase on coating surfaces. The present study aims at elucidating the epitaxial quality and microstructure of TiN and VN films grown by unbalanced d.c. magnetron sputtering fromTi andV targets in Ar+N2 on (100) and (111)MgO substrates.X-ray diffraction and electron back-scatter diffraction give evidence for epitaxial growth of the films on both MgO substrate orientations. Transmission electron microscopy studies reveal a cube-on-cube orientation for all film/substrate combinations. The higher dislocation density and larger fraction of misoriented grains for VN films onMgOis explained by the higher growth rate and lattice mismatch compared to TiN. Nanoindentationmeasurements of the (100) oriented singlecrystal films reveal hardness values of ∼35 GPa for TiN and ∼23 GPa for VN.

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Language(s): eng - English
 Dates: 2007-09-232007-12
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: DOI: 10.1016/j.tsf.2007.06.104
 Degree: -

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Title: Thin Solid Films
  Abbreviation : Thin Solid Films
Source Genre: Journal
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Publ. Info: Lausanne, Switzerland, etc. : Elsevier
Pages: - Volume / Issue: 516 (2-4) Sequence Number: - Start / End Page: 369 - 373 Identifier: ISSN: 0040-6090
CoNE: /journals/resource/954925449792