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  Chemical Vapor Deposition of N-Doped Graphene and Carbon Films: The Role of Precursors and Gas Phase

Ito, Y., Christodoulou, C., Nardi, M. V., Koch, N., Sachdev, H., & Müllen, K. (2014). Chemical Vapor Deposition of N-Doped Graphene and Carbon Films: The Role of Precursors and Gas Phase. ACS Nano, 8(4), 3337-3346. doi:10.1021/nn405661b.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-B6C1-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0029-6C1F-C
Genre: Journal Article

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 Creators:
Ito, Yoshikazu1, Author           
Christodoulou, C., Author
Nardi, M. V., Author
Koch, N., Author
Sachdev, Hermann1, Author           
Müllen, Klaus1, Author           
Affiliations:
1Dept. Müllen: Synthetic Chemistry, MPI for Polymer Research, Max Planck Society, ou_1800289              

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Language(s): eng - English
 Dates: 2014
 Publication Status: Issued
 Pages: -
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 Rev. Type: -
 Identifiers: DOI: 10.1021/nn405661b
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Project name : Nanograph
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Title: ACS Nano
Source Genre: Journal
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Publ. Info: Washington, DC : American Chemical Society
Pages: - Volume / Issue: 8 (4) Sequence Number: - Start / End Page: 3337 - 3346 Identifier: Other: 1936-0851
CoNE: https://pure.mpg.de/cone/journals/resource/1936-0851