Electronic Structure and Stability of Fluorophore-Nitroxide Radicals from 
Ultrahigh Vacuum to Air Exposure

Kakavandi, R.; Ravat, Prince; Savu, S. A.; Borozdina, Yulia B.; Baumgarten, Martin; Casu, M. B.

doi:10.1021/am508854u

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Electronic Structure and Stability of Fluorophore-Nitroxide Radicals from Ultrahigh Vacuum to Air Exposure

Kakavandi, R., Ravat, P., Savu, S. A., Borozdina, Y. B., Baumgarten, M., & Casu, M. B. (2015). Electronic Structure and Stability of Fluorophore-Nitroxide Radicals from Ultrahigh Vacuum to Air Exposure. ACS Applied Materials and Interfaces, 7(3), 1685-1692. doi:10.1021/am508854u.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0025-BD9D-3 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0025-BD9E-1

Genre: Journal Article

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Creators:
Kakavandi, R., Author
Ravat, Prince¹, Author
Savu, S. A., Author
Borozdina, Yulia B.¹, Author
Baumgarten, Martin¹, Author
Casu, M. B., Author

Affiliations:
1Dept. Müllen: Synthetic Chemistry, MPI for Polymer Research, Max Planck Society, ou_1800289

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Language(s): eng - English

Dates: Published in Print: 2015

Publication Status: Published in print

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Identifiers: DOI: 10.1021/am508854u

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Title: ACS Applied Materials and Interfaces

Abbreviation : ACS Appl. Mater. Interfaces

Source Genre: Journal

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Publ. Info: Washington, DC : American Chemical Society

Pages: - Volume / Issue: 7 (3) Sequence Number: - Start / End Page: 1685 - 1692 Identifier: ISSN: 1944-8244
CoNE: https://pure.mpg.de/cone/journals/resource/1944-8244