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  Wachstumsmechanismen bei der plasmagestützten Abscheidung von Kohlenwasserstoffschichten, eine in situ Ellipsometriestudie

von Keudell, A.(1996). Wachstumsmechanismen bei der plasmagestützten Abscheidung von Kohlenwasserstoffschichten, eine in situ Ellipsometriestudie (IPP 9/110). Garching: Max-Planck-Institut für Plasmaphysik.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-617B-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-617C-E
Genre: Report
Alternative Title : Growth mechanisms during the plasma enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry

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 Creators:
von Keudell, A.1, Author           
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

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Language(s): deu - German
 Dates: 1996
 Publication Status: Issued
 Pages: 93 p.
 Publishing info: Garching : Max-Planck-Institut für Plasmaphysik
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 378698
Report Nr.: IPP 9/110
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