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  Die Rolle von Ionen und Radikalen bei der plasmagestützten Abscheidung amorpher wasserstoffhaltiger Kohlenstoffschichten

Lange, K.(1995). Die Rolle von Ionen und Radikalen bei der plasmagestützten Abscheidung amorpher wasserstoffhaltiger Kohlenstoffschichten (IPP 9/106). Garching: Max-Planck-Institut für Plasmaphysik.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-6217-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-6218-A
Genre: Report
Alternative Title : The role of ions and radicals in plasma-enhanced deposition of amorphous hydrogenatd carbon films

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 Creators:
Lange, K.1, Author           
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Language(s): deu - German
 Dates: 1995
 Publication Status: Issued
 Pages: 132 p.
 Publishing info: Garching : Max-Planck-Institut für Plasmaphysik
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 378700
Report Nr.: IPP 9/106
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