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  A Statistical Approach to Plasma Profile Analysis.

Kardaun, O. J. W. F., Riedel, K. S., McCarthy, P. J., & Lackner, K.(1990). A Statistical Approach to Plasma Profile Analysis. (IPP 5/35). Garching (DE): Max-Planck-Institut für Plasmaphysik.

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IPP_5_35.1.pdf (Any fulltext), 35MB
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 Creators:
Kardaun, O. J. W. F.1, Author           
Riedel, K. S.2, Author
McCarthy, P. J.1, Author           
Lackner, K.1, Author           
Affiliations:
1Tokamak Theory (TOK), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856309              
2New York University, 251 Mercer Str., New York, USA. University College, Cork, Ireland., ou_persistent22              

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Language(s): eng - English
 Dates: 1990
 Publication Status: Issued
 Pages: 40 pp.
 Publishing info: Garching (DE) : Max-Planck-Institut für Plasmaphysik
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 655537
Report Nr.: IPP 5/35
 Degree: -

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