Growth precursors for a-C:H film deposition in a pulsed inductively coupled 
methane plasmas

Bauer, M.; Schwarz-Selinger, T.; Jacob, W.; von Keudell, A.

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Growth precursors for a-C:H film deposition in a pulsed inductively coupled methane plasmas

Bauer, M., Schwarz-Selinger, T., Jacob, W., & von Keudell, A. (2005). Growth precursors for a-C:H film deposition in a pulsed inductively coupled methane plasmas. Journal of Applied Physics, 98: 073302.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-16D2-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-16D3-8

Genre: Journal Article

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Creators:
Bauer, M.^{1, 2}, Author
Schwarz-Selinger, T.^{1, 2}, Author
Jacob, W.^{1, 2}, Author
von Keudell, A.³, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328
3External Organizations, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 2005

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 226979

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Title: Journal of Applied Physics

Source Genre: Journal

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Pages: - Volume / Issue: 98 Sequence Number: 073302 Start / End Page: - Identifier: ISSN: 0021-8979