Control of the plasma chemistry of a pulsed inductively coupled methane plasma

Bauer, M.; Schwarz-Selinger, T.; Kang, H.; von Keudell, A.

doi:10.1088/0963-0252/14/3/017

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Control of the plasma chemistry of a pulsed inductively coupled methane plasma

Bauer, M., Schwarz-Selinger, T., Kang, H., & von Keudell, A. (2005). Control of the plasma chemistry of a pulsed inductively coupled methane plasma. Plasma Sources Science and Technology, 14, 543-548. doi:10.1088/0963-0252/14/3/017.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-1801-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-1802-0

Genre: Journal Article

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Creators:
Bauer, M.^{1, 2}, Author
Schwarz-Selinger, T.^{1, 2}, Author
Kang, H.^{1, 2}, Author
von Keudell, A.³, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328
3External Organizations, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 2005

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 237856
DOI: 10.1088/0963-0252/14/3/017

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Title: Plasma Sources Science and Technology

Source Genre: Journal

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Pages: - Volume / Issue: 14 Sequence Number: - Start / End Page: 543 - 548 Identifier: ISSN: 13616595 (Online)