Elementary processes in plasma-surface interaction: H-atom and ion-induced 
chemisorption of methyl on hydrocarbon film surfaces

von Keudell, A.; Jacob, W.

doi:10.1016/j.progsurf.2004.001

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Elementary processes in plasma-surface interaction: H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces

von Keudell, A., & Jacob, W. (2004). Elementary processes in plasma-surface interaction: H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces. Progress in Surface Science, 76, 21-54. doi:10.1016/j.progsurf.2004.001.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-1B17-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-1B18-A

Genre: Journal Article

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Creators:
von Keudell, A.¹, Author
Jacob, W.^{2, 3}, Author

Affiliations:
1External Organizations, ou_persistent22
2Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325
3Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Language(s): eng - English

Dates: Date issued: 2004

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 117421
DOI: 10.1016/j.progsurf.2004.001

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Title: Progress in Surface Science

Source Genre: Journal

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Pages: - Volume / Issue: 76 Sequence Number: - Start / End Page: 21 - 54 Identifier: -