Sputtering mechanisms near the threshold energy

Eckstein, W.; Roth, J.; Nagel, W.; Dohmen, R.

doi:10.1016/j.jnucmat.2004.03.010

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Sputtering mechanisms near the threshold energy

Eckstein, W., Roth, J., Nagel, W., & Dohmen, R. (2004). Sputtering mechanisms near the threshold energy. Journal of Nuclear Materials, 328, 55-61. doi:10.1016/j.jnucmat.2004.03.010.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-1C6F-2 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-1C70-B

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Urheber:
Eckstein, W.¹, Autor
Roth, J.¹, Autor
Nagel, W.², Autor
Dohmen, R.², Autor

Affiliations:
1Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328
2Computer Center Garching (RZG), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856297