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  Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system

Yoon, J.-S., Fischer, R., Gori, S., & Knauer, J. (2004). Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system. Journal of the Korean Physical Society, 6, 1544-1552.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0027-20E8-F Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0027-20E9-D
Genre: Journal Article

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 Creators:
Yoon, J.-S.1, Author
Fischer, R.2, 3, Author              
Gori, S.2, 3, Author              
Knauer, J.4, Author              
Affiliations:
1Korea Basic Sci Inst, Natl Fus R&D Ctr, Taejon, 305806 South Korea; Ctr Interdisciplinary Plasma Science, Garching, D-85748 Germany, ou_persistent22              
2Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325              
3Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              
4W7-X: Project Coordination (PC), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856303              

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Language(s): eng - English
 Dates: 2004
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: eDoc: 208503
 Degree: -

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Title: Journal of the Korean Physical Society
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 6 Sequence Number: - Start / End Page: 1544 - 1552 Identifier: ISSN: 0374-4884