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  Characterisation of deposited hydrocarbon layers below the divertor and in the pumping ducts of ASDEX Upgrade

Mayer, M., Rohde, V., von Keudell, A., & ASDEX Upgrade Team (2003). Characterisation of deposited hydrocarbon layers below the divertor and in the pumping ducts of ASDEX Upgrade. Journal of Nuclear Materials, 313-316, 429-433. doi:10.1016/S0022-3115(02)01407-1.

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 Creators:
Mayer, M.1, Author           
Rohde, V.2, Author           
von Keudell, A.3, 4, Author           
ASDEX Upgrade Team5, Author
Affiliations:
1Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              
2Experimental Plasma Physics 1 (E1), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856295              
3Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325              
4Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              
5Max Planck Institute for Plasma Physics, Max Planck Society, Boltzmannstraße 2, D-85748 Garching, DE, ou_1856284              

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Free keywords: 15th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 15), Gifu, 2002-05-26 to 2002-05-31
 Abstract: The growth of codeposited layers has been studied with long term samples below the divertor IIb and in a pump duct of ASDEX Upgrade from March to August 2001. The composition of redeposited layers and their optical properties were analyzed with ion beam techniques and ellipsometry. The deposition in the sub-divertor area showed a complicated deposition pattern with a maximum deposition of about 1.3 μm. All deposits form soft hydrocarbon layers which consist ainly of deuterium and carbon with D/C from 0.7 to 1.4. Only a small deposition was observed in the pump duct, with a maximum of about 2.5×10<sup>15</sup> D-atoms/cm² at the duct entrance. The observed deposition pattern in the duct is compared with simulation calculations assuming neutral hydrocarbon radicals as precursors for film deposition. The deposition pattern can be explained by two different radical species with surface loss probabilities β<10<sup>-3</sup> and 0.1≤β≤0.9. The most likely species are CD<sub>3</sub>, C<sub>2</sub>D<sub>5</sub> and C<sub>2</sub>D<sub>3</sub> radicals.

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Language(s): eng - English
 Dates: 2003
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Journal of Nuclear Materials
  Alternative Title : J. Nucl. Mater.
Source Genre: Journal
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Publ. Info: Copyright © 2003 Elsevier Science B.V. All rights reserved
Pages: - Volume / Issue: 313-316 Sequence Number: - Start / End Page: 429 - 433 Identifier: -