Chemical sputtering of hydrocarbon films

Hopf, C.; von Keudell, A.; Jacob, W.

doi:10.1063/1.1594273

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Chemical sputtering of hydrocarbon films

Hopf, C., von Keudell, A., & Jacob, W. (2003). Chemical sputtering of hydrocarbon films. Journal of Applied Physics, 94(4), 2373-2380. doi:10.1063/1.1594273.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-3B61-E Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-3B64-8

Genre: Journal Article

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Creators:
Hopf, C.^{1, 2}, Author
von Keudell, A.^{1, 2}, Author
Jacob, W.^{1, 2}, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325

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Language(s): eng - English

Dates: Date issued: 2003

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 59912
DOI: 10.1063/1.1594273
URI: http://ojps.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=JAPIAU000094000004002373000001&idtype=cvips
Other: CIPS Reprint No. 127

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Title: Journal of Applied Physics

Alternative Title : J. Appl. Phys.

Source Genre: Journal

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Pages: - Volume / Issue: 94 (4) Sequence Number: - Start / End Page: 2373 - 2380 Identifier: -