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  Ion beam analysis of rough thin films

Mayer, M. (2002). Ion beam analysis of rough thin films. Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms, 194(2), 177-186.

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 Urheber:
Mayer, M.1, Autor           
Affiliations:
1Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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 Zusammenfassung: The influence of surface roughness on Rutherford backscattering spectroscopy (RBS) spectra has been studied experimentally and by computer simulation with the SIMNRA code. Rough thin films are described by a distribution of film thicknesses, while rough substrates are approximated by a distribution of local inclination angles. Correlation effects of surface roughness are neglected. Rough film effects can be calculated for RBS including non-Rutherford scattering, nuclear reaction analysis and elastic recoil detection analysis. The results of simulation calculations show good agreement with experimental data. For thin films of high Z elements on rough substrates additionally plural scattering plays an important role. (C) 2002 Elsevier Science B.V. All rights reserved.

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Sprache(n): eng - English
 Datum: 2002-08
 Publikationsstatus: Erschienen
 Seiten: -
 Ort, Verlag, Ausgabe: -
 Inhaltsverzeichnis: -
 Art der Begutachtung: Expertenbegutachtung
 Identifikatoren: eDoc: 21029
ISI: 000177450200010
 Art des Abschluß: -

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Titel: Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms
  Alternativer Titel : Nucl. Instrum. Methods Phys. Res. B
Genre der Quelle: Zeitschrift
 Urheber:
Affiliations:
Ort, Verlag, Ausgabe: -
Seiten: - Band / Heft: 194 (2) Artikelnummer: - Start- / Endseite: 177 - 186 Identifikator: ISSN: 0168-583X