Plasma deposition and characterization of AI2O3 coating

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Plasma deposition and characterization of AI₂O₃ coating

Mazurelle, J. (2002). Plasma deposition and characterization of AI₂O₃ coating. Diploma Thesis, École Nationale Supérieure de Chimie de Paris, Paris.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-44A8-1 Version Permalink: https://hdl.handle.net/21.11116/0000-0006-C008-8

Genre: Thesis

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Creators:
Mazurelle, J.¹, Author

Affiliations:
1Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328

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Language(s): eng - English

Dates: Accepted: 2002Date issued: 2002

Publication Status: Issued

Pages: -

Publishing info: Paris : École Nationale Supérieure de Chimie de Paris

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 24423

Degree: Diploma

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