Influence of deposition temperature and bias voltage on the crystalline phase 
of Er2O3 thin films deposited by filtered cathodic arc

Adelhelm, C.; Pickert, T.; Koch, F.; Balden, M.; Jahn, S.; Rinke, M.; Maier, H.

doi:10.1016/j.jnucmat.2010.12.163

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Influence of deposition temperature and bias voltage on the crystalline phase of Er₂O₃ thin films deposited by filtered cathodic arc

Adelhelm, C., Pickert, T., Koch, F., Balden, M., Jahn, S., Rinke, M., et al. (2011). Influence of deposition temperature and bias voltage on the crystalline phase of Er₂O₃ thin films deposited by filtered cathodic arc. Journal of Nuclear Materials, 417(1-3), 798-801. doi:10.1016/j.jnucmat.2010.12.163.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-E899-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-E89A-0

Genre: Journal Article

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Creators:
Adelhelm, C.^{1, 2}, Author
Pickert, T.¹, Author
Koch, F.^{1, 2}, Author
Balden, M.^{1, 2}, Author
Jahn, S.¹, Author
Rinke, M.³, Author
Maier, H.⁴, Author

Affiliations:
1Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328
2Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327
3Forschungszentrum Karlsruhe, Institute for Materials Research I, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany, ou_persistent22
4Max Planck Society, ou_persistent13

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Free keywords: 14th International Conference on Fusion Reactor Materials (ICFRM-14), Sapporo, 2009-09-06 to 2009-09-11

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Language(s): eng - English

Dates: Date issued: 2011

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 435491
DOI: 10.1016/j.jnucmat.2010.12.163
URI: http://dx.doi.org/10.1016/j.jnucmat.2010.12.163

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Title: Journal of Nuclear Materials

Source Genre: Journal

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Publ. Info: Elsevier B.V.

Pages: - Volume / Issue: 417 (1-3) Sequence Number: - Start / End Page: 798 - 801 Identifier: -