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  Molecular size effect in the chemical sputtering of a-C:H thin films by low energy H+, H2+, and H3+ ions

Harris, P. R., Meyer, F. W., Jacob, W., Schwarz-Selinger, T., & von Toussaint, U. (2011). Molecular size effect in the chemical sputtering of a-C:H thin films by low energy H+, H2+, and H3+ ions. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 269(11), 1276-1279. doi:10.1016/j.nimb.2010.12.071.

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 Creators:
Harris, P. R.1, Author
Meyer, F. W.1, Author
Jacob, W.2, 3, Author           
Schwarz-Selinger, T.2, 3, Author           
von Toussaint, U.2, 3, Author           
Affiliations:
1Physics Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6372, ou_persistent22              
2Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327              
3Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Free keywords: 18th International Workshop on Inelastic Ion-Surface Collisions (IISC-18), Gatlinburg, USA, 2010-09-26 to 2010-10-01
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Language(s): eng - English
 Dates: 2011
 Publication Status: Issued
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 Rev. Type: Peer
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Title: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Source Genre: Journal
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Publ. Info: Elsevier B.V.
Pages: - Volume / Issue: 269 (11) Sequence Number: - Start / End Page: 1276 - 1279 Identifier: -