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  Layer Morphology Analysis of Sputter-eroded Silicon Gratings using Rutherford Backscattering

Langhuth, H., Mayer, M., & Lindig, S. (2011). Layer Morphology Analysis of Sputter-eroded Silicon Gratings using Rutherford Backscattering. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 269(16), 1811-1817. doi:10.1016/j.nimb.2011.05.002.

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 Creators:
Langhuth, H.1, 2, Author              
Mayer, M.1, 2, Author              
Lindig, S.1, 2, Author              
Affiliations:
1Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327              
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Language(s): eng - English
 Dates: 2011
 Publication Status: Published in print
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 Table of Contents: -
 Rev. Type: Peer
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Title: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Source Genre: Journal
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Publ. Info: Elsevier
Pages: - Volume / Issue: 269 (16) Sequence Number: - Start / End Page: 1811 - 1817 Identifier: -